Plasma Treatments

In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from a wafer. Using a plasma source, a monatomic (single atom) substance known as a reactive species is generated. Oxygen or fluorine is the most common reactive species. The reactive species combines with the photoresist to form ash which is […]

Surface wettability plays an important role in determining the function of a wound dressing. Dressings with hydrophobic surfaces are suitable for bacterial adsorption, however, a hydrophilic surface is needed to improve cell attachment for most anchorage-dependent cell types. Furthermore, the  hydrophobicity/hydrophilicity of the surface can be used to direct cellular processes such as cell initial