Spin Coater System and Photo Resist

Spin Coater System and Photo Resist

Spin Coater System Applying uniform thin films to flat substrates can be achieved by spin coating procedure. An excess amount of a solution is applied to a substrate (manually: using a syringe, or automatically: with a dispense unit and dispense nozzles in the lid of the spin coater). The substrate is then rotated at high …

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